UAE logo trademark No. 1719989

1 - Chemicals; gas for industrial purposes; industrial chemicals for use as gel-like column packing materials for high performance liquid chromatography; photopolymerization initiator; chemicals for the manufacture of paints; glue and adhesives for industrial purposes, not for stationery and household purposes; plant growth regulating preparations; fertilizers; higher fatty acids; artificial graphite; flour and starch for industrial purposes; plastics [raw materials]; chemicals for the manufacture of fragrance constituents or cosmetics; chemical additives for lubricating oils; water- absorbing resin; isobutane; ethylene; hydrocarbon; propylene [propene]; methane; raffinate [chemicals]; hydrogen; allyl alcohol; n- propyl acetate; acetaldehyde [ethanal]; acetic acid; vinyl acetate; ethyl acetate; dry ice [carbon dioxide]; liquefied carbon dioxide; argon; helium; oxygen; nitrogen; n-methyl-2- pyrrolidone; propylene glycol monomethyl ether; propylene glycol monomethyl ether acetate; organic solvents for industrial use; chemical solvents; removing solvents for photoresist; solvents for printed circuit board; ungluing preparations; separating and unsticking [ungluing] preparations; high-purity solvents as cleaning agents for use in manufacturing processes; solvents for liquid crystal display; cleaner solvents for electronic devices; rinse solvents for electronic devices; gamma-butyrolactone; ethyl lactate; hexafluoroethane; tetrafluoromethane; octafluoropropane; octafluorocyclobutane; trifluoromethane; difluoromethane; fluoromethane; ammonia; nitrous oxide; chlorine; boron trichloride; hydrogen bromide; sulfur hexafluoride; nitrogen trifluoride; hexafluoro-1, 3- butadiene; sodium chlorate; sodium hypochlorite; liquid chlorine; caustic soda; hydrochloric acid; sodium cyanide; sulfuric acid; glycine [amino acetic acid]; ammonium sulphate; chlorinated polyethylene; L-tetrasodium glutamate diacetate; acrylonitrile; ethylenediaminetetraaceticacid tetrasodiumsalt; sodium sulfate; synthetic resins emulsion, unprocessed; unsaturated polyester resins, unprocessed; vinyl ester resins, unprocessed; liquid chemicals made of polymers; tetramethylammonium hydroxide; poly-n- vinylacetamide; resins for electronic materials; p- xylylenediamine; tetrafluoroterephthalonitrile; tetrafluorobenzonitrile; p- (aminomethyl)benzoic acid; p- cyanobenzylamine; p- cyanobenzaldehyde; p- cyanobenzoyl chloride; p- cyanobenzoic acid; ethyl p- cyanobenzoate; NIR- photosensitive dyes; organic borate compounds; multifunctional thiol; isocyanate monomer; blocked isocyanate monomer; isocyanate compounds; magnesium ascorbyl phosphate; sodium ascorbyl phosphate; ascorbyl palmitate trisodium phosphate; n- vinylacetamide; poly-n- vinylacetamide; sodium polyacrylate; isophthalonitrile; terephthalonitrile; sodium dl-a- tocopheryl phosphate; butyrolactonethiol; methyl hesperidin; alumina filler; aluminium oxides [alumina]; alumina; spherical alumina; roundish alumina; ceramic particles for industrial use; boron nitride ceramics sintered; hexagonal boron nitride powder; titanium oxides; mould-release preparations; graphite powder; industrial chemicals for use in charge dissipation for electron beam lithography; artificial graphite fine powder; carbon nanotube; sterilized gas; standard reagent for sterile gas residual analysis; chemical condensed gas; refrigerant gas; food preservation gas; mortar adhesion enhancer; ultrafine cationic acrylic resins; polypropylene; coating agents, other than paints; fullerenes and other carbons; polyamide- imide resins; coating material for photosensitive insulating films; water-based acrylic resins for automobile paint; industrial conductive adhesives; conductive adhesive for die bonding; epoxy molding compound for semiconductors; liquid encapsulant; industrial detergents for molding die of semiconductors; high heat resistance coating materials; chemical preparations for forming a moisture-proof insulating layer; solder resist; chemicals for u…